One tip I received on helping with this is :

1)  Put wafer on spinner
2)  Flood wafer with resist thinner (for example, AZ 1500)
3)  Put on a lot of resist
4)  Wait about 15 seconds
5)  Spin

Hope this helps.

David Nemeth
Senior Process Engineer
Sophia Wireless, Inc.
14225-C Sullyfield Circle
Chantilly, VA
Ph: (703) 961-9573 x206
Fax:(703) 961-9576

-----Original Message-----
From: [email protected] [mailto:[email protected]]On
Behalf Of li gang
Sent: Monday, November 05, 2001 3:23 AM
To: [email protected]
Subject: [mems-talk] Photoresist spining on corrugated wafers


Dear all:

  I will do some photolithography steps after some corrugations formed
on the wafers. The depth of the corrugations are about 5~7 microns.
The corrugations are formed by this way: Etching silicon by SF6+O2,
namely RIE etching silicon.
  However, I found the effect of the photoresist spining was very bad,
even though I slow down the rev to 500 rpm. Could you give some advice
or share some experience with me? Any help will be greatly appreciated.

Thanks in advance,

Li Gang




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