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MEMSnet Home: MEMS-Talk: AZ 5214E and 5206 Photoresist Application
AZ 5214E and 5206 Photoresist Application
2001-11-10
MKDariel
AZ 5214E and 5206 Photoresist Application
MKDariel
2001-11-10
Hi,
I wish to apply these resists to some 3 inch Lithium Niobate wafers. Does anyone
have experience with dehydration bake before resist application? can you
recommend a spinner procedure (time, rpm) that would produce a 1 micron film?

Thanks,

Moti

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