Hi,
I'm working on research with SU8-100 at the University of Dundee, Scotland.
I've succeeded in attaining re-producable films of SU8 >400um on a silicon
substrate. However, after UV exposure, as soon as I begin the post exposure
bake, I get heavy deformations (ripples) in the
film surface. I've tried everything I can think of to stop this, including
starting from room temp, but to no avail. Can anybody suggest something????
Thanks in advance for your help.

Kevin Banks

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