Dear All,

I am Mr. Decarli, I am doing my thesis in  material science at ITC-Irst
research Institute (Trento, Italy).
I am interested in anisotropic etching with TMAH solutions; in particular I am
trying to project a mask pattern to investigate the behaviour of different
crystallographic planes (100,110,111,.....)and to define some parameters as
etching rate (100) function of TMAH concentration, underetching rate,different
value of theoretical and experimental angle between (100) and
(111),underetching rate  versus mask-edge angle.  Any suggestions about
possible investigations in this field will be wellcome.
Thanks in advance for any suggestion.
Best regards
Massimiliano Decarli

************************
Massimiliano Decarli
Via Sommarive 18
38050 Povo (Trento)
Italy
Tel. 0039 0461 314468
e-mail [email protected]
*************************