Dear members,

We are interested in acquiring a software tool for simulating anisotropic wet
silicon etching. We are therefore looking for any information you could have
concerning existing softwares and their advantages and drawbacks.

Does anyone for example have any experience with the simulation tool SIMODE?

Yours sincerely,

Christine ALEPEE
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|                                                 |
|  Christine ALEPEE                               |
|  Microsystems Institute - IN                    |
|  Swiss Federal Institute of Technology          |
|  CH - 1015 Lausanne                             |
|                                                 |
|  Phone:       +41 21 693 66 98                  |
|  Fax:         +41 21 693 66 70                  |
|  Email:       [email protected]  |
|_________________________________________________|