Hi Ken,

I4m starting to work with porous silicon and I found some reference about
ammonium fluoride as electrolyte in the process of PS formation. The main
advantage of the ammonium fluoride, in this case, is that it etches the
alumminum with a rate of about five times lower than HF etches. If do you
want I can pass the reference to you (or the pdf file).

Bye,
Luiz Marangoni
lc_marangoni@bol.com.br




>Hello,
>
>     I am looking for a literature or an article about effect of using
> ammonium flouride in oxide wet etching (BOE) and in isotropic silicon wet
> etching.  I know that it is acting as a buffer but I want to know about
> its mechanism and any experiment results showing why ammonium flouride is
> prefered in some cases.
>
>Thank you.
>
>Ken.
>
>
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