Hi Members,
I am working as a SPA in a MEMS research Project entitled " Developement of a
Silicon Micromechanical Accelerometer" in the Microelectronics Centre, E & ECE
department,IIT Kharagpur. We are trying to etch silicon wafer from backside in
KOH solution(44%wt)at room temperature with a wax coating to protect on the
frontside of the wafer. But the wax layer over silicon is washed out very
quickly in KOH solution. Can anyone help in this regard? Does any body have
experience in KOH etching of silicon using wax as a protective layer.Please send
Suggestions and alternatives. Thanking you in advance.
                                                   Kanishka Biswas


--
Click here for your very own create-a-date adventure from MatchMaker
Go to http://ecard.matchmaker.com/dating.html