I spin at 1250RPM for 8-9sec to get an even coating and than step up to the
speed that gives the desired thickness.



-----Original Message-----
From: Alok Paranjpye 
Date: Tue, 15 Jan 2002 13:47:52 -0800 (PST)
To: mems-talk@memsnet.org
Subject: [mems-talk] AZ4620 problems


> I have a requirement for a thick (~6+ um) positive resist layer. I've been
> trying to use AZ4620 at 4000 rpm for this purpose, but it always gives me
> an uneven, streaky coating, with the streaks running in the  radial
> direction on the wafer. I have tried ramping the spin rate to avoid this,
> but the streaks remain. If anybody has had a similar experience, and could
> help me out, it would be great. Alternately, I'd appreciate any
> suggestions for another resist that could give me a thick coat, and could
> be exposed on an i-line stepper.
> Thanks
> Alok Paranjpye
>
> Graduate Student
> University of California,
> Santa Barbara
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