Dear Martin,

I had a similar problem few months ago trying to etch FHD silica. Finally,
I used a mask of evaporated Cr with photoresist on top and it survived at least
2h in
silicon dioxide etchant 4:1.

Good luck!

Sonia.

*****************************************************

Sonia Garcia-Blanco

Department of Electronics and Electrical Engineering
University of Glasgow
Oakfield Ave.
G12 8LT
Glasgow

Phone:
   Office: (0141) 339 8855 ext 0101
   Lab:    (0141) 330 6014
Email: sgblanco@elec.gla.ac.uk

****************************************************

On Tue, 22 Jan 2002, Marty Patton wrote:

> Dear Mems Folks,
> I want to etch a thick oxide on silicon.   BOE attacks the negative
> photoresist.  Is there another wet chemistry way?
> Thanks for your help.
> Marty
>
> Martin O. Patton
> Senior Research Engineer
> Essential Research Incorporated
> 6410 Eastland Road
> Cleveland, Ohio 44142
> www.er.com
> (440) 816-9850
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