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MEMSnet Home: MEMS-Talk: Negative Photoresist
Negative Photoresist
2002-01-29
Peng Jin
2002-01-29
Paolo Bondavalli
2002-01-29
Matthieu Guirardel
2002-01-29
Michael Yakimov
2002-01-30
Perroud, Olivier
Negative Photoresist
Paolo Bondavalli
2002-01-29
Hi Peng,
The best is BCB by DowCorning.
I also know PDMS by Wackerchemie or Gelest but it's quite difficult to
obtain.
Bye

Peng Jin a icrit :

> Hi, friends,
>
> In my research project, I need to find a kind of negative photoresist which
> must be easy to remove by acetone or other chemical solvent. Could anyone
give
> me some idea about it?
>
> Thanks.
>
> Peng Jin
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--
*********************************************************
Dr. Paolo Bondavalli
R&D Engineer
LABCOM - Laboratoire Interconnexions Optiques et MEMS
THALES (ex THOMSON-CSF) CORPORATE RESEARCH CENTER
Domaine de Corbeville,
Route Departementale 128
F91404 ORSAY
(FRANCE)
Tel : 01 69 33 08 63
Fax : 01 69 33 08 62
Email : Paolo.Bondavalli@thalesgroup.com
**********************************************************
Disclaimer: Opinions expressed herein are my own and may
  not represent those of my employer.
**********************************************************

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