Bob,
   What is the difference between etching PI in pure O2 and O2+CF4?

Mike

>>> BobHendu@aol.com 01/31/02 14:22 PM >>>
Oxygen plasma in an asher with a little bit 2-4% cf4 works well
depending on
the type of polyimide you are trying to remove and if it has been cured
or
not.
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