For what it's worth, I've had "reasonable" success using 1000A Cr as a mask for
KOH and EDP.  600A Cr might work better--haven't tried it.

Roger Brennan

-----Original Message-----
From:   Vladimir Kutchoukov [SMTP:v.g.kutchoukov@its.tudelft.nl]
Sent:   Monday, February 04, 2002 5:38 AM
To:     mems-talk@memsnet.org
Subject:        [mems-talk] chrome as a protectitive layer in TMAH etching of
silicon

Dear MEMS members,

It has been reported that 40nm Cr can be used as a mask to etch silicon in
KOH solution, capable of withstanding the KOH for at least 12h:

http://galaxy.micro.uiuc.edu/facilities/processes/etching/silicon_cr_in_koh.
html

I am curious if Cr can be used as a mask to etch silicon in TMAH solution.
Has somebody an experience with Cr as an etching mask in TMAH?

Thanks a lot,
Vladimir
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