Re: Au sticking on oxide ([email protected])

> I am trying to get Au patterns adhere to either silicon
> oxide or nitride or even silicon without any barriers /
> adhesion layers. Any good tricks or solutions?

If the oxide surface is clean, i.e., near-atomically-clean, then Au will
adhere to e.g., quartz (single crystal SiO2), well enough for many
applications.  We have deposited pure Au, with no adhesion layer, onto
UV-ozone cleaned quartz crystals (resonators), and, after hermetically
sealing the resonators, we shock tested them up to 36,000 g.  We never had a
failure due to the gold film coming off the quartz surfaces.  On the other
hand, adhesive tape will pull off the gold, but, for our application, that
didn't matter.

..............John Vig.


-----Original Message-----
From: [email protected]
[mailto:[email protected]]
Sent: Monday, February 04, 2002 12:01 PM
To: [email protected]
Subject: mems-talk digest, Vol 1 #178 - 19 msgs


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Today's Topics:

   1. Re: HMDS: is it really that bad? (shay kaplan)
   2. LPCVD Polysilicon (Rohit Srivastava)
   3. Re: HMDS: is it really that bad? (li gang)
   4. RE: MEMS Technology (Roger Brennan)
   5. RE: [Q] Mask for isotropic silicon wet etch? (fwd) (Roger Brennan)
   6. How to pattern UV glue? (Tao YU)
   7. MEMS Technology (Craig McGray)
   8. Re: Corona Discharge in Micro Gap (Craig McGray)
   9. Au sticking on oxide & Dry etch simulation software
([email protected])
  10. RE:polyimide stripper? (Rivas, Isabel)
  11. chrome as a protectitive layer in TMAH etching of silicon (Vladimir
Kutchoukov)
  12. RE: MEMS Technology (Luesebrink Helge)
  13. Re: Information/Paper reference about wet silicon
       nitride etchant. ([email protected])
  14. RE: chrome as a protectitive layer in TMAH etching
       of silicon (Roger Brennan)
  15. Re: HMDS: is it really that bad? (Inna)
  16. Re: polyimide stripper? ([email protected])
  17. RE: Foturan photo-etchables glass Bonding to Silicon Wafer (Heike
Bartsch de Torres)

--__--__--

Message: 1
Date: Sun, 03 Feb 2002 18:36:02 +0200
From: shay kaplan 
To: [email protected]
Subject: Re: [mems-talk] HMDS: is it really that bad?
Reply-To: [email protected]

Dear Jennifer,
Way back,HMDS was widely used as a 10-20% solution in EGMEA wich was the
positive resist solvent. The fumes of both together was reported to cause
some health problems and was not reccomended for pregnant women. I tend to
think that when the industry moved to PGMEA 'safe solvent' the problem went
away.

Shay

Jennifer Scalf wrote:

> I've heard from many people that HMDS is very, very bad for you.
> However, the few MSDSs that I have read do no indicate that it is
> anything other than a strong irritant and highly flammable.  Why do
> people seem to think it is a teratogen, mutagen, carcinogen, etc?  Do
> some MSDS's have more information than others?  If so, can someone point
> me toward one that explains hazards other than irritation and
> flammability.
>
> Jennifer
> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.mems-exchange.org/

--__--__--

Message: 2
Date: Sun, 3 Feb 2002 09:00:26 -0800 (PST)
From: Rohit Srivastava 
To: [email protected]
Subject: [mems-talk] LPCVD Polysilicon
Reply-To: [email protected]

Hi,
   Can someone tell me where I can have LPCVD
polysilicon deposited and doped on a 4" wafer in the
US?
Rohit
Institute for Micromanufacturing
Lousiana Tech University
Ruston, LA 71272
Great stuff seeking new owners in Yahoo! Auctions!
http://auctions.yahoo.com

--__--__--

Message: 3
From: "li gang" 
To: [email protected]
Subject: Re: [mems-talk] HMDS: is it really that bad?
Date: Mon, 04 Feb 2002 02:37:42 +0800
Reply-To: [email protected]

If you are a male, HMDS will affect your fertile activity.




======= 2002-01-31 DzTZ@4PEVPP45@#:=======

>I've heard from many people that HMDS is very, very bad for you.
>However, the few MSDSs that I have read do no indicate that it is
>anything other than a strong irritant and highly flammable.  Why do
>people seem to think it is a teratogen, mutagen, carcinogen, etc?  Do
>some MSDS's have more information than others?  If so, can someone point
>me toward one that explains hazards other than irritation and
>flammability.
>
>Jennifer
>_______________________________________________
>[email protected] mailing list: to unsubscribe or change your list
>options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
>Hosted by the MEMS Exchange, providers of MEMS processing services.
>Visit us at http://www.mems-exchange.org/



_________________________________________________________________
Send and receive Hotmail on your mobile device: http://mobile.msn.com

--__--__--

Message: 4
From: Roger Brennan 
To: "'[email protected]'" 
Subject: RE: [mems-talk] MEMS Technology
Date: Sun, 3 Feb 2002 12:27:45 -0800
Reply-To: [email protected]

Jim,

It is refreshing to find a recruiter who wants to learn something.

Marc Madou's book is probably a good place to start.

Author: Madou, Marc Title: Fundamentals of Microfabrication Publ. Year:
01.1997 Price: DM 160,80 B ISBN: 0849394511 Editor: CRC PRESS INC

Good Luck,
roger brennan
-----Original Message-----
From:   James E. Slate [SMTP:[email protected]]
Sent:   Friday, February 01, 2002 7:42 AM
To:     [email protected]
Subject:        [mems-talk] MEMS Technology

I hope this note will not be considered inappropriate.  I am a recruiter and
have developed an interest and a curiosity about MEMS technology,  including
its evolution and applications.   Prior to actively working in the field, I
am
trying to educate myself about the state of the art.   I wondered if there
is
a good source of technical information (in layman's terms)  and
publications
that keep up with both research and commercial activities.  Thanks to anyone
who takes time to respond.
Jim Slate
President
Fortune Personnel Consultants
Topsfield, Ma
www.topsfpc.com
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/

--__--__--

Message: 5
From: Roger Brennan 
To: "'[email protected]'" 
Subject: RE: [mems-talk] [Q] Mask for isotropic silicon wet etch? (fwd)
Date: Sun, 3 Feb 2002 13:06:59 -0800
Reply-To: [email protected]

Thermally grown SiO2 works rather well for nitric-HF.

Silicon nitride has also been used.  Do a search for "isotropic etch
problem".


-----Original Message-----
From:   Zigurts Majumdar [SMTP:[email protected]]
Sent:   Friday, February 01, 2002 9:15 AM
To:     [email protected]
Subject:        [mems-talk] [Q] Mask for isotropic silicon wet etch? (fwd)

Hi,

I am trying to isotropically wet etch silicon using a 126:60:5 HNO3:H20:NH4F
etchant (as described by Williams and Muller, J. of MEMS 1996).  The etchant
appears to work well, but masks made of AZ5214 do not.  In less than
15 minutes, the AZ5214 layer has visibly thinned and formed holes.

Can anyone recommend a more durable mask (PR, metal, both or otherwise) for
this etchant?

Thanks!

Ziggy
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/

--__--__--

Message: 6
Date: Sun, 3 Feb 2002 20:59:32 -0700
From: Tao YU 
Organization: CSU
To: [email protected]
Subject: [mems-talk] How to pattern UV glue?
Reply-To: [email protected]

Hi, friends,

Does anyone know how to pattern UV glue? Is there any way to pattern
UV glue like photoresist?

Thanks

Tao Yu
ECE department
Colorado State Unversity

--__--__--

Message: 7
Date: Mon, 04 Feb 2002 00:25:44 -0500
From: Craig McGray 
To: [email protected], [email protected]
Subject: [mems-talk] MEMS Technology
Reply-To: [email protected]

Hi Jim,

Here are a few references to get you started:

The first is a reference to the MEMS research going on at Sandia
National Labs. In addition to being exciting and high-quality work, the
research there has the advantage of being highly accessible to a lay
audience -- they typically build mechanical devices at the micro-scale
whose macro-scale equivalents are household items: gears, chains, pad
locks, etc. You can find their work on-line at:

http://mems.sandia.gov/scripts/index.asp

The next two are texts that have a slightly technical bent, but are
presented at the introductory level. Either of these could serve as a
textbook for an undergraduate course in MEMS, and yet both are great
references for researchers who are active in the field of MEMS. They
are:

Marc Madou
"Fundamentals of Microfabrication"
CRC Press, 1997
http://www.biomems.net/

Greg Kovacs
"Micromachined Transducers Sourcebook"
McGraw Hill, 1998

The last is the Journal of Microelectromechanical Systems (JMEMS),
published by IEEE. This is highly technical, but represents the state of
the art in the field at any given time. You can find this journal
on-line at:

http://ieeexplore.ieee.org/lpdocs/epic03/RecentIssues.htm?punumber=84

Best wishes in all your efforts!

-Craig McGray
 Dartmouth College

--__--__--

Message: 8
Date: Mon, 04 Feb 2002 00:44:59 -0500
From: Craig McGray 
To: [email protected], [email protected]
Subject: [mems-talk] Re: Corona Discharge in Micro Gap
Reply-To: [email protected]

Hello Sanghoon,

I am also very interested in this phenomenon, and would appreciate hearing
from you when you find further information on this topic. In the meantime,
here are a few references to get you started:


Wibbeler, J.; Pfeifer, G.; Hietschold, M.
"Parasitic charging of dielectric surfaces in capacitive
microelectromechanical systems (MEMS)"
Sensors and Actuators A (Physical)
v. A71,  p. 74, 1998

Chan, Garikipati, Dutton
"Characterization of Contact Electromechanics Through Capactitance-Voltage
Measurements and Simulations"
Journal of Microelectromechanical Systems
v. 8, no. 2, June 1999

Buchanan, Abram, Morant
"Charge Trapping in Silicon-Rich Si3N4 Thin Films"
Solid-State Electronics, v. 30, no. 12, p.1295-1301


Best wishes in all your research!

-Craig McGray
 Dartmouth College



[email protected] wrote:

> Message: 12
> From: "Sanghoon Lee" 
> To: 
> Date: Fri, 1 Feb 2002 13:18:12 -0700
> Subject: [mems-talk] Corona discharge in a micro gap
> Reply-To: [email protected]
>
> Deal all,
>
> I'm working on the feasibility study of corona discharge
> for micro actuators. However, I couldn't find papers talking
> about that phenomena in the micro domain.
> I need fundamental equations and experimental data for
> point-plane (sharp electrode - plane coated with insulator)
> corona system.
>
> AND.. Could anybody explain to me what is the different effect
> on the insulator between the field emission and the corona discharge?
> I think in both case ions (or electrodes) can stick to the insulator.
>
> Thank you.
>
> Best wishes,
>
> Sanghoon Lee

--__--__--

Message: 9
To: [email protected]
Date: Mon, 04 Feb 2002 14:56:13 +0800 (SGT)
From: [email protected]
Subject: [mems-talk] Au sticking on oxide & Dry etch simulation software
Reply-To: [email protected]

Dear MEMS colleagues,

1) I am trying to get Au patterns adhere to either silicon
oxide or nitride or even silicon without any barriers /
adhesion layers. Any good tricks or solutions? Is lift-off
viable?

2) Any non-commercial software for me to download to
perform dry etching evaluation with different process
parameters? And can the software adopt a RIE, ICP, or ECR
mode form of etching?

Please kindly advise. Many thanks in advance.

Best,
Randall, Ph.D
Singapore,DLS

--__--__--

Message: 10
From: "Rivas, Isabel" 
To: "'[email protected]'" 
Subject: RE:[mems-talk] polyimide stripper?
Date: Mon, 4 Feb 2002 10:28:09 +0100
Reply-To: [email protected]

Hi Arti,

I was in an error about the n-butyl acetate. It only take off a photoresist
layer.
I'm sorry.

Best regards,

    Isabel.




-----Original Message-----
From: apatel43 [mailto:[email protected]]
Sent: jueves 31 de enero de 2002 17:42
To: [email protected]
Subject: [mems-talk] polyimide stripper?


Hi,

I was wondering if anyone knows of a photoresist stripper which would take
off
a polyimide layer?

Thanks,
Arti Patel

Arti Patel
Research Assistant/Graduate Student
University of Illinois at Chicago
Department of Bioengineering
851 S. Morgan St. (m/c 063)
Chicago, IL 60607
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/

--__--__--

Message: 11
From: "Vladimir Kutchoukov" 
To: 
Date: Mon, 4 Feb 2002 14:37:35 +0100
Subject: [mems-talk] chrome as a protectitive layer in TMAH etching of
silicon
Reply-To: [email protected]

Dear MEMS members,

It has been reported that 40nm Cr can be used as a mask to etch silicon in
KOH solution, capable of withstanding the KOH for at least 12h:

http://galaxy.micro.uiuc.edu/facilities/processes/etching/silicon_cr_in_koh.
html

I am curious if Cr can be used as a mask to etch silicon in TMAH solution.
Has somebody an experience with Cr as an etching mask in TMAH?

Thanks a lot,
Vladimir

--__--__--

Message: 12
From: Luesebrink Helge 
To: [email protected]
Subject: RE: [mems-talk] MEMS Technology
Date: Mon, 4 Feb 2002 09:37:57 -0500
Reply-To: [email protected]

http://www.biomems.net/LivingBook/LivingBook.htm


cheers,
Helge


                -----Original Message-----
                From:   James E. Slate [mailto:[email protected]]
                Sent:   Friday, February 01, 2002 10:42 AM
                To:     [email protected]
                Subject:        [mems-talk] MEMS Technology

                I hope this note will not be considered inappropriate.  I am
a recruiter and
                have developed an interest and a curiosity about MEMS
technology,  including
                its evolution and applications.   Prior to actively working
in the field, I am
                trying to educate myself about the state of the art.   I
wondered if there is
                a good source of technical information (in layman's terms)
and  publications
                that keep up with both research and commercial activities.
Thanks to anyone
                who takes time to respond.
                Jim Slate
                President
                Fortune Personnel Consultants
                Topsfield, Ma
                www.topsfpc.com
                _______________________________________________
                [email protected] mailing list: to unsubscribe or change
your list
                options, visit
http://mail.mems-exchange.org/mailman/listinfo/mems-talk
                Hosted by the MEMS Exchange, providers of MEMS processing
services.
                Visit us at http://www.mems-exchange.org/

--__--__--

Message: 13
From: [email protected]
Date: Mon, 4 Feb 2002 10:00:00 EST
Subject: Re: [mems-talk] Information/Paper reference about wet silicon
  nitride etchant.
To: [email protected]
Reply-To: [email protected]

By far the best method for etching Nitride is plasma. It provides control of

undercut and it doesn't require hot phosphoric acid.

--__--__--

Message: 14
From: Roger Brennan 
To: "'[email protected]'" 
Subject: RE: [mems-talk] chrome as a protectitive layer in TMAH etching
  of silicon
Date: Mon, 4 Feb 2002 07:08:37 -0800
Reply-To: [email protected]

For what it's worth, I've had "reasonable" success using 1000A Cr as a mask
for KOH and EDP.  600A Cr might work better--haven't tried it.

Roger Brennan

-----Original Message-----
From:   Vladimir Kutchoukov [SMTP:[email protected]]
Sent:   Monday, February 04, 2002 5:38 AM
To:     [email protected]
Subject:        [mems-talk] chrome as a protectitive layer in TMAH etching
of silicon

Dear MEMS members,

It has been reported that 40nm Cr can be used as a mask to etch silicon in
KOH solution, capable of withstanding the KOH for at least 12h:

http://galaxy.micro.uiuc.edu/facilities/processes/etching/silicon_cr_in_koh.
html

I am curious if Cr can be used as a mask to etch silicon in TMAH solution.
Has somebody an experience with Cr as an etching mask in TMAH?

Thanks a lot,
Vladimir
_______________________________________________
[email protected] mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.mems-exchange.org/

--__--__--

Message: 15
Date: Mon, 04 Feb 2002 10:11:34 -0500
Subject: Re: [mems-talk] HMDS: is it really that bad?
From: Inna 
To: 
Reply-To: [email protected]

Does it affect female's fertile activity though?

Inna.


on 2/3/02 1:37 PM, li gang at [email protected] wrote:

> If you are a male, HMDS will affect your fertile activity.
>
>
>
>
> ======= 2002-01-31 DzTZ@4PEVPP45@#:=======
>
>> I've heard from many people that HMDS is very, very bad for you.
>> However, the few MSDSs that I have read do no indicate that it is
>> anything other than a strong irritant and highly flammable.  Why do
>> people seem to think it is a teratogen, mutagen, carcinogen, etc?  Do
>> some MSDS's have more information than others?  If so, can someone point
>> me toward one that explains hazards other than irritation and
>> flammability.
>>
>> Jennifer

--__--__--

Message: 16
From: [email protected]
Date: Mon, 4 Feb 2002 10:22:20 EST
Subject: Re: [mems-talk] polyimide stripper?
To: [email protected]
Reply-To: [email protected]

Depending on the composition of the PI and how much organic filler they use
the CF4 might be necessary to remove or etch to give you a clean etch.
Sometimes with just O2 you will end up with artifacts on the surface. The
CF4
helps to produce a clean strip. bob

--__--__--

Message: 17
Date: Mon, 04 Feb 2002 17:22:25 +0000
From: Heike Bartsch de Torres 
To: Lior Grossman , [email protected]
Subject: [mems-talk] RE: Foturan photo-etchables glass Bonding to Silicon
Wafer
Reply-To: [email protected]

hi Lior,
as I know, it is not possible to reduce the CTE mismatch betwenn silicon
and photosensitive glasses because of the composition of this kind of
glasses. There is a research group at the Technical University Ilmenau,
Germany dealing with this subject. You can contact Mr. Alf Harnisch,
e-mail: [email protected] 
By the way, it is also possible to structure pyrex or any kind of glass
by sandblasting. For information contact:
Little Things Factory 
Germany
Regards Heike


--__--__--

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End of mems-talk Digest