A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: DRIE Vs Wet etch
DRIE Vs Wet etch
2002-02-21
Sampath, Suresh
DRIE Vs Wet etch
Sampath, Suresh
2002-02-21
Hi Manoj,

Its great to know that SCL, India is planning to setup a MEMS fab.  This
should help in promoting MEMS awareness in India.

Regarding your question about DRIE V/S Wet etch,  I would strongly advise
you to go in for DRIE.  The main reason is high aspect ratio requirement in
MEMS products.  Wet etch is ok in some of the common MEMS products like
pressure sensors and accelerometers. But majority of the present day
products in optical MEMS, bio mems and other areas need  deep silicon
etching with vertical side walls. Also many products might require circular
holes through the wafer which again require DRIE.

 In my opinion a good MEMS fab should have DRIE and wafer bonding
capabilities apart from the standard processes.

Good luck in your endeavor

Suresh   Sampath
Process Engineer

Innovative Micro Technology
75 Robin Hill Road * Santa Barbara, CA  93117
Ph:  805-681-2896 * Fx:  805-967-2677
[email protected]   * www.imtmems.com


[demime 0.98e removed an attachment of type image/gif which had a name of
image001.gif]

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Tanner EDA by Mentor Graphics
Addison Engineering
The Branford Group
Process Variations in Microsystems Manufacturing