Hi,

Besides AZ MIF327, you may try AZ 400K developer.
I think you could try this Al etchant  H3PO4:HNO3:CH3COOH:DI=16:1:1:2 .
We used this etchant to pattern Al as interconnecton line on Pt resistor.

Yun-Ju Chuang

----- Original Message -----
From: "Greg Miller" 
To: 
Sent: Thursday, March 07, 2002 6:23 AM
Subject: RE: [mems-talk] Problem in etching Al and Pt


> You might want to try AZ MIF 327 Photoresist developer - you might stand
> a better chance of etching your Al film - its very slow but works quite
> well.
>
> Greg Miller
> KVH
>
> -----Original Message-----
> From: Hoyin [mailto:[email protected]]
> Sent: Monday, March 04, 2002 9:38 AM
> To: [email protected]
> Subject: [mems-talk] Problem in etching Al and Pt
>
>
>  Hi all,
>
>      I have got a simple question.   I want to sacrifically release my =
>  device by etching Al. However, one of the layer is Pt. Will the Al =
>  etchant etch Pt  ???  What etchant do you suggest??
>
>  Thank you very much!!!
>
>  Hoyin
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