Hi Mathieu,

There's an article in Vacuum called "reactive ion etching of quartz and
silica-based glasses in CF4/CHF3 plasmas"
by Patrick W. Leech. Vacuum 55 (1999) pp. 191-196 (No info about mask
material though as far as I can see.)

and not about quartz but maybe informative:
Deep reactive ion etching of Pyrex glass using SF6 plasma, Sensors and
Actuators A: Physical, Volume 87, Issue 3, 5 January 2001, Pages 139-145


Kind regards,
Heiko van der Linden

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MESA+ Research Institute
      Twente University
         P.O. Box 217
     7500 AE Enschede
       The Netherlands
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-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of BURRI Mathieu
Sent: Monday, March 11, 2002 12:17 PM
To: [email protected]
Subject: [mems-talk] DRIE of quartz


Dear MEMS society,

I want to make holes (diameter 3-5 um, depth 40-50 um) in a QUARTZ
substrate by DRIE etching. Which mask materials, photoresist,... should
be used? Any comments and/or etch recipes are welcome.

Thanks

Regards
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