Hi,
If I use AZ400K to etch Al, what is the mask I should use? I try
to use AZ5214 PR. But not very good...Some of the pattern is etched.
Thank you
Hoyin
On Fri, 8 Mar 2002, Yun-Ju Chuang wrote:
> Hi,
>
> Besides AZ MIF327, you may try AZ 400K developer.
> I think you could try this Al etchant H3PO4:HNO3:CH3COOH:DI=16:1:1:2 .
> We used this etchant to pattern Al as interconnecton line on Pt resistor.
>
> Yun-Ju Chuang
>
> ----- Original Message -----
> From: "Greg Miller"
> To:
> Sent: Thursday, March 07, 2002 6:23 AM
> Subject: RE: [mems-talk] Problem in etching Al and Pt
>
>
> > You might want to try AZ MIF 327 Photoresist developer - you might stand
> > a better chance of etching your Al film - its very slow but works quite
> > well.
> >
> > Greg Miller
> > KVH
> >
> > -----Original Message-----
> > From: Hoyin [mailto:[email protected]]
> > Sent: Monday, March 04, 2002 9:38 AM
> > To: [email protected]
> > Subject: [mems-talk] Problem in etching Al and Pt
> >
> >
> > Hi all,
> >
> > I have got a simple question. I want to sacrifically release my =
> > device by etching Al. However, one of the layer is Pt. Will the Al =
> > etchant etch Pt ??? What etchant do you suggest??
> >
> > Thank you very much!!!
> >
> > Hoyin
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