Hi Wu-Cheng,
One of my fellow students etches SiNx with concentrated (49%) HF. It
etches away *slowly* but it will do the job without attacking the Si. Of
course, HF attacks just about everything else...

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 18-121, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Rule #6: There is no rule #6" -- Monty Python
"ARTICLE SIX:  THIS ARTICLE IS ABOLISHED" -- Constitution of Afghanistan

On Tue, 13 Mar 2001, Wu-Cheng Kuo wrote:

> Hi,everybody:
>
>        I used SiNx as the KOH etching mask and etched the Silicon. After
> etching the
> Silicon,the SiNx remains on the structure. To fear destroying the structure,I
> can't
> use H3PO4 to remove the residual SiNx. Does anyone have any good ideas?
>
> Best Regards
>
> BagelKuo
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