Hi

I noted the problems with material intermixing and incompatibilities
in my  process. Basically, the solvent of SU-8 2 seems to attack and
dissolve the hard baked positive photoresists (AZ9260) which I use as a wax.

Would appreciate if any one of you can suggest how to prevent such intermix.

You may also list the positive and negative photoresit which is compatible
with SU8 series of resists.


Thanks,
Mani
Hewlett-Packard Singapore (Pte) Ltd