Dear Colleagues,
I am trying to etch silicon nitride( 6 microns
thick) which is deposited on a silicon wafer using
PECVD. I wana etch it anisotropically using RIE.
The machine which we have is 700 SERISE WAFER/BATCH,
PLASMA PROCESSING SYSTEM, DUAL CHAMBER. Can any one
give me some parameters which I can use as a starting
point for my experiments.
Can I use a photoresist as my masking layer?
Any suggestion will be highly appreciated.
Regards
Rahul Agarwal
Quoting [email protected]:
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>
> Today's Topics:
>
> 1. Re: Feynman (Mighty Platypus)
> 2. RE: Cu Electric Deposition in Cleanroom? (Bill
Moffat)
> 3. Re: Feynman (Jordan M. Berg)
> 4. RE: mems-talk digest, Vol 1 #239 - 1 msg
(Gordon Whitlock)
> 5. Lithography services for 76mm?
([email protected])
> 6. Re: Cu Electric Deposition in Cleanroom? (Henry
Yang)
> 7. Re: Cu Electric Deposition in Cleanroom?
(Wuyong Peng)
>
> --__--__--
>
> Message: 1
> Date: Mon, 1 Apr 2002 08:57:22 -0800 (PST)
> From: Mighty Platypus
> To: [email protected]
> Subject: Re: [mems-talk] Feynman
> Reply-To: [email protected]
>
> I've got the article ("There's Plenty of Room at the
Bottom") in
> _Micromechanics and MEMS: Classic and Seminal Papers
to 1990_. It was also
> reprinted in JMEMS V.1, No.1, which is available at
IEEExplore. In
> addition, it was originally published in
_Miniaturization_, though my copy
> doesn't say when.
>
> There is also a follow-up article called "Infitesimal
Machinery" in the
> same book, or in JMEMS V.2, No.1.
>
>
> Jesse Fowler
> UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129,
ENGR IV
> Los Angeles, CA 90095-1597 | (310)825-3977
> "Battery is safe if not provoked." -- _Batteries in a
Portable World_
>
> On Mon, 1 Apr 2002, Thomas B. Jones wrote:
>
> > Dear Colleagues:
> >
> > Can someone tell me the original source of Richard
Feynman's prophetic
> > statement that "there is room at the bottom"? I
would like to obtain the
> > text of his talk, if that is available in some form.
> >
> > By the way, for those interested in such things,
there is lots of
> relevant
> > discussion about the scaling of physical laws to be
found in the series
> of
> > lectures Feynman gave at Cornell in 1964, which
were published in a
> volume
> > called "The Character of Physical Law," MIT Press,
1967.
> >
> > Thanks.
> >
> > Tom Jones
> >
> >
> >
________________________________________________________
> > Thomas B. Jones
> > Professor of Electrical Engineering
> > University of Rochester
> > P.O. Box 270126
> > Rochester, NY 14627-0126 (USA)
> > phone: 1-585-275-5233 fax: 1-585-273-4919
> > email: [email protected]
> > http://www.ece.rochester.edu/~jones
> >
________________________________________________________
> > _______________________________________________
> > [email protected] mailing list: to unsubscribe
or change your list
> > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > Visit us at http://www.mems-exchange.org/
>
> --__--__--
>
> Message: 2
> Subject: RE: [mems-talk] Cu Electric Deposition in
Cleanroom?
> Date: Mon, 1 Apr 2002 09:10:36 -0800
> From: "Bill Moffat"
> To:
> Reply-To: [email protected]
>
> Monte,
> We at YES have produced an image reversal unit
to allow a lift off
> profile for metal lift off. It is a standard process
in the GaAs, Indium,
> Lithium market. As it seems to answer some of the
problems for the MEMS
> guys
> it is possible we will have to look into is our
method of resist definition
> compatible with your type of metal deposition. If
this is the case we may
> investigate it together to see if we can answer some
of our customers
> requests
> better. I am aware this may not fit with your
ability to etch as etch is
> not
> required with lift off. But if the geometry or metal
type is such that
> lift
> off is the best answer we should be prepared. The
only criteria for metal
> lift off is the metal deposition should not be too
high a temperature at
> the
> substrate to avoid frying the resist. If there is
any interest on a
> co-operative effort please contact me. Bill Moffat,
C.E.O. Yield
> Engineering
> Systems. 408 954 8353
>
> -----Original Message-----
> From: Heaton, Monte
[mailto:[email protected]]
> Sent: Friday, March 29, 2002 11:26 AM
> To: '[email protected]'; [email protected]
> Subject: [mems-talk] Cu Electric Deposition in
Cleanroom?
>
>
> Hello Wuyong:
>
> Innovative Micro Technology has deposition and etch
capabilities for a
> large
> portion of the periodic table, including Cu. Please
contact me directly
> for
> more information.
>
> Regards-Monte
>
> Monteith G. Heaton
> VP Marketing and Sales
> Innovative Micro Technology
> 75 Robin Hill Road * Santa Barbara, CA 93117
> Ph: 805-681-2852 * Fx: 805-967-2677
> [email protected] *
www.imtmems.com
>
> _________________________________________
> "Your strategic partner for MEMS design and 6" wafer
> manufacturing services with 0.355m photolithography,
> 30,000 sq. ft. fab, and non-CMOS materials
flexibility,
> including metals/magnetics."
>
> -----Original Message-----
> From: Wuyong Peng [mailto:]
> Sent: Thursday, March 28, 2002 9:26 AM
> To: [email protected]
> Subject: [mems-talk] Cu Electric Deposition in
Cleanroom?
>
> Does anyone know if there is a cleanroom that allow
Cu electric deposition
> and etching? Thank you.
> Wuyong Peng
> MRC, NJIT
> _______________________________________________
> [email protected]
mailing list: to
> unsubscribe or change your list options, visit
> http://mail.mems-exchange.org/mailman/listinfo/mems-
talk
> Hosted by the
> MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.mems-exchange.org/
> _______________________________________________
> [email protected] mailing list: to unsubscribe or
change your list
> options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS
processing services.
> Visit us at http://www.mems-exchange.org/
>
> --__--__--
>
> Message: 3
> Date: Mon, 01 Apr 2002 11:35:59 -0800
> From: "Jordan M. Berg"
> To: [email protected]
> Subject: [mems-talk] Re: Feynman
> Reply-To: [email protected]
>
> Dear Tom,
>
> The text can be found reprinted in _Micromechanics
and MEMS: Classic and
> Seminal Papers to 1990_, edited by William Trimmer
and published by IEEE
> Press. You might also be interested in a 1983 follow-
up talk, which is
> transcribed is included in the same collection. It is
entitled
> "Infinitesimal Machinery," and describes potential
applications of MEMS,
> including among others a teleoperated game in which
one battles a
> paramecium.
>
> Jordan
> ------------------------------------------------------
--
> Jordan M. Berg, Ph.D., P.E.
> Associate Professor of Mechanical Engineering
> Texas Tech University
> Lubbock, TX 79409-1021
>
> [email protected]
>
> > ----- Original Message -----
> > Message: 12
> > Date: Mon, 1 Apr 2002 09:40:27 -0500
> > To: [email protected]
> > From: "Thomas B. Jones"
> > Subject: [mems-talk] Feynman
> > Reply-To: [email protected]
> >
> > Dear Colleagues:
> >
> > Can someone tell me the original source of Richard
Feynman's prophetic
> > statement that "there is room at the bottom"? I
would like to obtain the
> > text of his talk, if that is available in some form.
> >
> > Thanks.
> >
> > Tom Jones
>
> --__--__--
>
> Message: 4
> From: "Gordon Whitlock"
> To:
> Date: Mon, 1 Apr 2002 11:03:02 -0800
> Subject: [mems-talk] RE: mems-talk digest, Vol 1
#239 - 1 msg
> Reply-To: [email protected]
>
> Re: Al oxide removal
>
> You could remove the oxide in a plasma cluster load
lock system and
> transfer
> your substrate to the next step, keeping your
substrate under vacuum.
>
> Gordon Whitlock
> Business Manager
> Trion Technology
> 480-968-8818 x-11
> [email protected]
>
> -----Original Message-----
> From: [email protected] [mailto:mems-talk-
[email protected]]On
> Behalf Of [email protected]
> Sent: Saturday, March 30, 2002 9:01 AM
> To: [email protected]
> Subject: mems-talk digest, Vol 1 #239 - 1 msg
>
>
> Send mems-talk mailing list submissions to
> [email protected]
>
> To subscribe or unsubscribe via the World Wide Web,
visit
> http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> or, via email, send a message with subject or
body 'help' to
> [email protected]
>
> You can reach the person managing the list at
> [email protected]
>
> When replying, please edit your Subject line so it is
more specific
> than "Re: Contents of mems-talk digest..."
>
>
> Today's Topics:
>
> 1. Al oxide removal ([email protected])
>
> -- __--__--
>
> Message: 1
> To: [email protected]
> From: [email protected]
> Date: Fri, 29 Mar 2002 12:07:31 -0500
> Subject: [mems-talk] Al oxide removal
> Reply-To: [email protected]
>
> Dear MEMS coworkers,
>
> We currently utilize foundry service to fabricate our
MEMS platform, and we
> functionalize the platform by coating a proprietary
material. The existing
> platform design calls for, fresh out of foundry, a
SiO2 top layer with
> contact openings to the underlying Al.
>
> The issue we run into is that the exposed Al is
easily oxidized and the
> contact resistance varies from sample to sample. We
have tried using
> chemistry removing the aluminum oxide layer prior to
functionalization. Yet
> the oxidation happens so rapidly that a thin
insulating oxide is formed
> between sample transfer (in air), so we alleviated
but not eliminated the
> reproducibility difficulty.
>
> I appreciate any insights.
>
> Regards,
>
> Barry Chen
>
>
> -- __--__--
>
> _______________________________________________
> mems-talk mailing list
> [email protected]
> http://mail.mems-exchange.org/mailman/listinfo/mems-
talk
>
>
> End of mems-talk Digest
>
> --__--__--
>
> Message: 5
> From: [email protected]
> To: [email protected]
> Date: Mon, 1 Apr 2002 10:20:06 -0800
> Subject: [mems-talk] Lithography services for 76mm?
> Reply-To: [email protected]
>
> I'm looking for a company that can provide
lithography services for 76mm
> (3") InP substrates. I'd like a via pattern printed
using thick (~15um)
> photoresist. Via size would be ~50um.
>
> Thanks,
>
> Mark R-S
>
> --__--__--
>
> Message: 6
> Subject: Re: [mems-talk] Cu Electric Deposition in
Cleanroom?
> To: [email protected]
> From: "Henry Yang"
> Date: Mon, 1 Apr 2002 10:30:20 -0800
> Reply-To: [email protected]
>
> Ok, so that's electrodeposition or electroplating or
commonly refered to as
> plating that we are talking about, right?
>
> Sure I don't see why it is diffucult to do that in a
cleanroom environment.
> The only thing you have to worry about is cross
contamination. Make sure
> that you have a bench (or hood) that is desiginated
for Cu plating only. If
> you are not sharing the cleanroom with CMOS people,
then I don't think
> anyone would object. Just purchase the plating bath
from any of the
> reputable companies (Technics, for instance, although
I don't work for
> them...). Obviously you need a power supply and a
copper plate. A large
> beaker, with stir bar...
>
> Why were you concerned?
>
> Henry Yang
>
> "Wuyong Peng" @memsnet.org on
03/29/2002 09:33:28 AM
>
> Please respond to [email protected]
>
> Sent by: [email protected]
>
>
> To:
> cc:
> Subject: Re: [mems-talk] Cu Electric Deposition in
Cleanroom?
>
>
>
> Yes. It is also called plating. Any idea I can do it
in a cleanroom
> environment? Thanks in advance.
>
> Wuyong Peng
>
>
> ----- Original Message -----
> From: "Henry Yang"
> To:
> Sent: Thursday, March 28, 2002 9:30 PM
> Subject: Re: [mems-talk] Cu Electric Deposition in
Cleanroom?
>
>
> > WHat do you mean electric depositon? Is that the
same as
> electrodeposition,
> > as in electroplating?
> >
> > Henry Yang
> >
> > "Wuyong Peng" @memsnet.org on
03/28/2002 09:25:51 AM
> >
> > Please respond to [email protected]
> >
> > Sent by: [email protected]
> >
> >
> > To:
> > cc:
> > Subject: [mems-talk] Cu Electric Deposition in
Cleanroom?
> >
> >
> >
> > Does anyone know if there is a cleanroom that allow
Cu electric
> deposition
> > and
> > etching? Thank you.
> >
> > Wuyong Peng
> > MRC, NJIT
> > _______________________________________________
> > [email protected] mailing list: to unsubscribe
or change your list
> > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > Visit us at http://www.mems-exchange.org/
> > _______________________________________________
> > [email protected] mailing list: to unsubscribe
or change your list
> > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > Visit us at http://www.mems-exchange.org/
> _______________________________________________
> [email protected] mailing list: to unsubscribe or
change your list
> options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS
processing services.
> Visit us at http://www.mems-exchange.org/
>
> --__--__--
>
> Message: 7
> From: "Wuyong Peng"
> To:
> Subject: Re: [mems-talk] Cu Electric Deposition in
Cleanroom?
> Date: Mon, 1 Apr 2002 15:04:13 -0500
> Reply-To: [email protected]
>
> Hi Henry,
>
> Thank you for your reply. Actually we have a class
100 cleanroom here in
> NJIT. But they won't allow me doing Cu plating nor
etching there. And they
> also won't allow me doing process after that if my
wafer has been processed
> under a non-cleanroom environment. So I have to find
another cleanroom that
> allow Cu process then I can do other steps here
later. I don't know if I
> can
> find one, that's what I concerned.
>
> Wuyong Peng
> MRC, NJIT
>
>
> ----- Original Message -----
> From: "Henry Yang"
> To:
> Sent: Monday, April 01, 2002 1:30 PM
> Subject: Re: [mems-talk] Cu Electric Deposition in
Cleanroom?
>
>
> > Ok, so that's electrodeposition or electroplating
or commonly refered to
> as
> > plating that we are talking about, right?
> >
> > Sure I don't see why it is diffucult to do that in
a cleanroom
> environment.
> > The only thing you have to worry about is cross
contamination. Make sure
> > that you have a bench (or hood) that is desiginated
for Cu plating only.
> If
> > you are not sharing the cleanroom with CMOS people,
then I don't think
> > anyone would object. Just purchase the plating bath
from any of the
> > reputable companies (Technics, for instance,
although I don't work for
> > them...). Obviously you need a power supply and a
copper plate. A large
> > beaker, with stir bar...
> >
> > Why were you concerned?
> >
> > Henry Yang
> >
> > "Wuyong Peng" @memsnet.org on
03/29/2002 09:33:28 AM
> >
> > Please respond to [email protected]
> >
> > Sent by: [email protected]
> >
> >
> > To:
> > cc:
> > Subject: Re: [mems-talk] Cu Electric Deposition
in Cleanroom?
> >
> >
> >
> > Yes. It is also called plating. Any idea I can do
it in a cleanroom
> > environment? Thanks in advance.
> >
> > Wuyong Peng
> >
> >
> > ----- Original Message -----
> > From: "Henry Yang"
> > To:
> > Sent: Thursday, March 28, 2002 9:30 PM
> > Subject: Re: [mems-talk] Cu Electric Deposition in
Cleanroom?
> >
> >
> > > WHat do you mean electric depositon? Is that the
same as
> > electrodeposition,
> > > as in electroplating?
> > >
> > > Henry Yang
> > >
> > > "Wuyong Peng" @memsnet.org on
03/28/2002 09:25:51
> AM
> > >
> > > Please respond to [email protected]
> > >
> > > Sent by: [email protected]
> > >
> > >
> > > To:
> > > cc:
> > > Subject: [mems-talk] Cu Electric Deposition in
Cleanroom?
> > >
> > >
> > >
> > > Does anyone know if there is a cleanroom that
allow Cu electric
> > deposition
> > > and
> > > etching? Thank you.
> > >
> > > Wuyong Peng
> > > MRC, NJIT
> > > _______________________________________________
> > > [email protected] mailing list: to
unsubscribe or change your list
> > > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > > Visit us at http://www.mems-exchange.org/
> > > _______________________________________________
> > > [email protected] mailing list: to
unsubscribe or change your list
> > > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > > Visit us at http://www.mems-exchange.org/
> > _______________________________________________
> > [email protected] mailing list: to unsubscribe
or change your list
> > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > Visit us at http://www.mems-exchange.org/
> > _______________________________________________
> > [email protected] mailing list: to unsubscribe
or change your list
> > options, visit http://mail.mems-
exchange.org/mailman/listinfo/mems-talk
> > Hosted by the MEMS Exchange, providers of MEMS
processing services.
> > Visit us at http://www.mems-exchange.org/
>
>
> --__--__--
>
> _______________________________________________
> mems-talk mailing list
> [email protected]
> http://mail.mems-exchange.org/mailman/listinfo/mems-
talk
>
>
> End of mems-talk Digest
>
nothing comes true unless first a dream
__________________________________________
| |
| |
/-) RAHUL AGARWAL (-\
/ /| 14401 HELLENIC Dr#B-7 |\ \
_( ( | TAMPA, FL- 33613 | ) )_
(((\ \| /-) 1-813-979-9176(Home) (-\ |/ /)))
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