3000A Cr was deposited by thermal evaporation on top
of SiO2 surface, and kept on table top for 3 month. Cr
layer peels off when DI water is squirted onto the
surface from wherever water touches. Can you suggest
any possible causes? Contact surface was supposedly
clean because I handed new clean wafers to this person
who did evaporation, but I don't know what kind of
effort was made to clean them further. Cr layer was ok
right after deposition, 3 month ago.
Thank you.

-Soojin
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