On Wed, 17 Apr 2002, Venubabu.U wrote:

  Hi,all:
      Can someone tell me the polysilicon wet etchant having good
      selectivity with Positive PR and less undercutting.
      Presently iam using HNA etchant(HF:HNO3:WATER :: 6:100:40).
      Iam realising some cantilevers with this etchant,iam getting the
      width of beam at the top is less compare to the bottom.
      I want uniform width from top to bottom.

      Any information is gratefully appreciated.
                                                         venu babu,
                                                         Research scholar,
                                                         IIT MADRAS, INDIA.

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