A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Re: selective dry etching of Al
Re: selective dry etching of Al
2002-04-19
[email protected]
2002-04-19
Qingwei Mo
Re: selective dry etching of Al
[email protected]
2002-04-19
Hi Arnaud

Unfortunately, your GaAs is likely to be etched significantly by anything
you can use to etch the Al layer.  Al will passivate effectively if you have
any fluorine present, so that should be avoided.  Your best hope is to try
wet etching with something like orthophosphoric acid.  This should remove
the Al at a reasonable rate.  As far as I know, it does not attack GaAs.

Regards, Martin

Martin Walker BSc(Tech) MSc
Tactical Marketing Engineer
Oxford Instruments Plasma Technology
North End, Yatton,
Bristol BS49 4AP  UK
T. +44 (0) 1934 837031
F. +44 (0) 1934 837001
E. 
W. 

 ###  OXFORD INSTRUMENTS   http://www.oxford-instruments.com/  ###

Unless stated above to be non-confidential, this E-mail and any
attachments are private and confidential and are for the addressee
only and may not be used, copied or disclosed save to the addressee.
If you have received this E-mail in error please notify us upon receipt
and delete it from your records. Internet communications are not secure
and Oxford Instruments is not responsible for their abuse by third
parties nor for any alteration or corruption in transmission.

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMStaff Inc.
Mentor Graphics Corporation
Tanner EDA by Mentor Graphics
Addison Engineering