Hello Anke,

I seem to remember having this problem 22 years ago. After etching the Ti:W
(in 30% H2O2 - stock solution), there would be a very slight residue.  Many
times we could only see it after passivation, but if you looked close enough
you could detect it.  If my memory serves me correctly, we dipped the wafers
in an EDTA etchant (after the H2O2), the other thing that worked was to etch
the Ti:W in 30% H2O2 in a Stainless-Steel tank.  I know it sounds strange,
but we fond that just using the SS tank made a great difference. I remember
we tried adding various Fe products in the Ti:W without much success.  I
hope this helps.

Charles Ellis
Auburn University...

----- Original Message -----
From: "Anke Stock" 
To: 
Sent: Thursday, April 25, 2002 2:17 AM
Subject: [mems-talk] Wet etching TiW


> Hello to everybody,
> is there someone who has experience in wet etching of TiW? I use a
> mixture of HCl and H2O2, but it seems that there are small amounts of
> TiW on the wafer after etching. Has someone experiences with parameters
> like temperature, time, other mixtures or something else? Many thanks
> for your help
> Anke
> _______________________________________________
> mems-talk@memsnet.org mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.mems-exchange.org/