David,

You could try multi-target deposition, perhaps in a reactive oxygen
atmosphere or post annealing in oxygen and/or nitrogen.

Refer to the following link for a starting point:
http://www-bsac.eecs.berkeley.edu/archive/masters/cliff_knollenberg_ms.pdf

Regards,

Mike Barger
Klesis Corporation
+1 215 527 0313


-----Original Message-----
From: mems-talk-admin@memsnet.org [mailto:mems-talk-admin@memsnet.org]On
Behalf Of Haigh, Richard
Sent: Friday, May 10, 2002 4:50 AM
To: mems-talk@memsnet.org
Subject: RE: [mems-talk] how to deposit PZT


David

I am not too familiar with sputtering PZT; I believe that this can be
done with a pzt target. I don't know how you would introduce doping ions
to your films. I am not too sure of the conditions used e.g. carrier
gas, type of sputtering system etc.

However, I have deposited thin films of pzt with sol-gel by means of
spin coating (chemical solution deposition). An advantage of this
process is that it allows good control over the homogeneity of the
deposited film. In other words sol gel rout allows you to control the
concentration of dopants, and to uniformly distribute them throughout
the deposited film. Please note that pzt needs to be sintered and
thermal treatments can interfere with other processes that you may be
considering on your wafer



Regards


Richard

-----Original Message-----
From: David Yen [mailto:yentajen@ucla.edu]
Sent: Thursday, May 09, 2002 6:22 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] how to deposit PZT

Dear all,

    Does anybody have experience or idea of depositing PZT, especially
by sputtering? Thanks a lot.

David
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