_______________________________________________________________________________


   Gurvinderjit Singh Ahluwalia             Tel: +91-0731-488656
     Laser Materials Division               Fax: +91-0731-488650
   Centre for Advanced Technology         email: [email protected]
   Indore - 452 013  INDIA

_______________________________________________________________________________

 >Dear David
            The quality(Stoichiometry) of the film you get by rf
or other supttering method may not be good, becuase PZT is multicomponent
oxide system. The best method is to get film by sol-gel. Nowdays people
are doing Pulse Laser Deposition (PLD) technique to get better quality
films. Following references may be helpful:
   (1) "Pulse Laser Deposition" G.K.Hubler et al, MRS Bulletin, Feb. 1992
(26-27)
   (2) " Dielectric properties ..... PZ on Si by PLD", Journal of Applied
Phys., 83,12, 1998(7803-7807)


Gurvinder


  > -----Original Message-----
> From: David Yen [mailto:[email protected]]
> Sent: Thursday, May 09, 2002 6:22 PM
> To: [email protected]
> Subject: [mems-talk] how to deposit PZT
>
> Dear all,
>
>     Does anybody have experience or idea of depositing PZT, especially
> by sputtering? Thanks a lot.
>
> David
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> _______________________________________________
> [email protected] mailing list: to unsubscribe or change your list
> options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
> Hosted by the MEMS Exchange, providers of MEMS processing services.
> Visit us at http://www.mems-exchange.org/