Please review the www site:
http://www.mems-exchange.org/
to learn about nitride services.

Sincerely,
Bob Hamilton

Javeed Shaikh Mohammed wrote:
>
> Hello all,
>          Iam a Graduate student looking for Process providers. I need to
> deposit a Silicon Nitride layer of thickness 0.3-0.6 microns. I need residual
> stress in the film to be TENSILE ( ranging 60-90 MPa). The Silicon nitride can
> be either PECVD or LPCVD.
>
> If anyone has some information, please mail me.
>
> Javeed Shaikh Mohammed,
> BIOMINDS LAB,IFM,
> Louisiana Tech University.
> Phone: (318) 257-5127
> FAX:   (318) 257-5104
> MAIL: PO Box 10307,911 Hergot Ave.
>       Ruston, LA  71272
>
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--

                        Bob Hamilton
                        Microlab Facilities Manager

                        University of California - Microlab
                        Rm 406 Cory Hall
                        Berkeley, CA 94720-1770
                        phone: 510 642-2716, fax: 510 642-2916
                        http://www-microlab.eecs.berkeley.edu:8080/