If you have SU-8 it can survive 30% HF solution for at least 2 hours if
properly cure.

Greg Miller
KVH

-----Original Message-----
From: Jing Liu [mailto:[email protected]]
Sent: Thursday, May 30, 2002 2:34 PM
To: [email protected]
Subject: [mems-talk] HF and photoresist mask


To who may concern,

I want to mask HF etching with photoresist. Just now, somebody suggest
me that
for the same thickness of oxide I will etch. The photoresist could stand

buffered HF, but for concentrated HF, it will not. Is it exactly the
case?
Could I be able to find some reference?

BTW, we have Shipley 1813, AZ 5214, Az 9245 in the lab. Does anyone have
some
date of how fast they will etched in HF?

Thanks,

Jing
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