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MEMSnet Home: MEMS-Talk: Photoresist for lift-off with fine patterns
Photoresist for lift-off with fine patterns
2002-06-05
Lin, Yaojian
2002-06-05
Bill Moffat
Photoresist for lift-off with fine patterns
Lin, Yaojian
2002-06-05
Dear MEMS folks,

I am looking for the photoresist that can be used in the lift-off process
with fine patterns (<10um), and can stand under the relative high
temperature and sputtering /MOCVD. Could you please share any related
information with me?

With many thanks,

Yaojian

reply
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