Dear Lisen,

The PGMEA solvent which is used for developing SU-8 is also commonly
used as a casting solvent for DNQ/novolac resists. Since the key
requirement for a casting solvent is it's ability to dissolve these
resists, PGMEA will attack even unexposed novolac resist films.

Very Best Regards,
Rob Hardman
617-965-5511 ext.313
[email protected]

www.microchem.com


Message: 6
Date: Mon, 17 Jun 2002 01:33:49 -0700 (PDT)
From: LSWANG 
To: [email protected]
Subject: [mems-talk] SU8 developer ?
Reply-To: [email protected]

Hi,

Does anyone know if SU-8 developer such as PGMEA also
attacks AZ series ( after exposed ) Photoresist.
Thanks.

Lisen Wang
Yahoo! - Official partner of 2002 FIFA World Cup
http://fifaworldcup.yahoo.com