Dear all.
I would like to ask about the cleaning of a sample and its keeping.

I prepared some metallic(Au/Ti) pattern on Silicon oxide(500nm)/Silicon.
As time goes on, the roughness of the surface is very high in AFM result.
For removing the roughness, I used ACETONE under ultrasonic for 10 seconds.
(I observed the destructing of the metallic pattern in case of long time
ultrasonic.)
This process is good but not excellent.
1. Does anyone knows about the other process for cleaning my sample?(I can't
uses some acid because of the metals.)
2. How can I store the wafer  to prevent the contamination when I complete the
fabrication process?
    How about coating with Photo-Resistor?

Thanks in advance.
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Mr. Sungjun Lee
Center for Science in Nanometer Scale,
Inter-University Semiconductor Research Center,
Seoul National University,
Seoul, 151-742, South Korea
Mobile:+82-16-2264658
Fax:+82-2-8748926
Mail:[email protected]
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