Dear Collegues,

After posted my questions about the thick photoresist, I received many
helpful answers and I'd like to share with you who are interested with this
issue. The answers are:

1. The NR series photoresist produced by Futurrex (www.futurrex.com) --
recommended by Dr P. Jin
2. Shipley SPR 220 resist -- recommended by Rob Hardman
3. AZ9200-series and 4500-series from Clariant (www.clariant.com)--
recommended by Niklas Mayerhofer and Dirk Grobe
4. Shipley microposit SJR 5740 -- recommended by Hong Qiao

These answers provided abundant options in thick photoresist applications,
but they all have a thickness limit below 100 microns, so I'm still curious
is there any positive resist with the thickness of more than 300um, which is
sensitive for UV light and easy to be removed by chemical liquid.

Another question: Does Clariant produce all of the AZ- tittled resist? Why I
can not find AZ4562 in Clariant's web pages?

Really do appreciate your help.

Best Wishes,
Hongjun Zeng
Microfabrication Applications Laboratory (MAL)
University of Illinois at Chicago
ERF Building, 842 W. Taylor Street
Chicago, IL 60607-7022
Room 3014 ERF
Tel.: 312-413-5889, Fax: 312-996-6465



-----Original Message-----
From: hzeng [mailto:hzeng@ece.uic.edu]
Sent: Tuesday, July 02, 2002 1:12 PM
To: mems-talk@memsnet.org
Cc: mems-talk-admin@memsnet.org; Hongjun Zeng
Subject: AZ4562 or other thick photoresist


Dear Collegues,

Could you help me to reach the answer of following questions,

1. Where can I get the AZ4562 photo resist, especially in US?
2. Is there any extreme thick photoresist else which can be easily removed
by chemical liquid such as acetone?

Thanks for your attention,

Hongjun Zeng
Microfabrication Applications Laboratory (MAL)
University of Illinois at Chicago
ERF Building, 842 W. Taylor Street
Chicago, IL 60607-7022
Room 3014 ERF
Tel.: 312-413-5889, Fax: 312-996-6465