Hello Francois,

there is a classic book

Principles of Semiconductor Photolithography by B. Moreau, published by
Academic Press.

this is an excellent book, more inclined towards the chemistry of
photolithography and influence of various parameters.
I must admit I have read it as a grad student some time ago, and it may not be
attuned to newest inventions and recipes in photolithography,
but it surely does have  lift off techiques using chlorobenzene and its
parameter based control

good luck
Amit

Amit Shiwalkar

"Your reality is a figment of my Imagination"
      ......... To me you exist because I imagine that you do.


Francois MONTAIGNE wrote:

> Hi everybody
>
> I have to lift off 200 nm thick SiO2 films deposited on various metalic
> films. During the deposition of these films by sputtering, the substrate is
> heated at temperatures around 100 0C and the lift off is quite difficult
> without using a chlorobenzene treatment of the resist (the resist used is
> S1813).
> Concerning that point, is there somewhere (book or article) a good review
> gathering the information about these treatments and the influence of the
> different parameters?
> It also exists commercial products to help the lift-off process (LOL by
> Shipley or LOR by MCC). What are the advantages of these products compared
> to the chlorobenzene solution?
> Is it possible to strip theses products without using remover but just
> aceton?
> A 1500C bake seems necessary, is it possible to reduce this temperature?
>
> Thanks in advance for your help...
>
> Francois Montaigne (LPM, University of Nancy, France)
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