Dear Changhong Ke,

I would recommend measuring the contact angle. The surface properties of
the Si substrate
are important and can vary depending on your process. The water may also
have some trace contaminants that may effect the results.  In addition, the
contact angle is usually broken down
into advancing/receding.
I believe that measuring the contact angle with respect to the process you
have ( realistic samples of the substrate and fluids) in mind will provide
you a more realistic value.


           Steve




At 01:50 PM 7/16/02 -0500, you wrote:
>Dear Members:
>
>Currently I want to know the contact angle of water on Si substrate and Cr
>substrate. However, I couldn't find it in  handbooks.
>If you happen to know the information, please drop me an emai, your help is
>greatly appreciated.
>
>changhong
>--------------------------------------
>Changhong Ke
>Mechanical Engineering
>Northwestern University
>2145 Sheridan Road
>Evanston,IL 60208-3111 USA
>Lab Phone:(847)467-7673
>Fax:(847)491-3540
>E_mail:c-ke@northwestern.edu
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