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MEMSnet Home: MEMS-Talk: Re: Dry etching SiO2, Vol 1 #349 - 9 msgs
Re: Dry etching SiO2, Vol 1 #349 - 9 msgs
2002-07-17
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Re: Dry etching SiO2, Vol 1 #349 - 9 msgs
[email protected]
2002-07-17
Lib,

The reason that you are getting a rough surface is that Cr does not form a
continuos film until 1500A to 2000A.  This is much thicker than most other
metals. Cr forms islands that slowly grow in size as thickness increases
until counties film is formed.
check your thickness and try thicker.

Long time Cr film user
Friend of Bill Moffit's

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