Sulfuric acid and hydrogen peroxide makes for a good organic cleaning
solution but there are some precautions you need to make with glass wafers.
After first mixing the solution there is an exothermic reaction that can
drive the temperature to around 120 degrees Centigrade. You need to allow the
solution temperature to drop to <100 C before applying heat from a hot plate.
At this point you need to slowly immerse the wafers into solution to avoid
thermal shock which can break your wafers. After a clean of say 5-10 minutes
the wafers should be removed and placed in a heated beaker of di water around
50C to again avoid the shock that can break the wafers. Then a final rinse
for 15 minutes in 25 C di water should rinse to proper resistivity and dry.
You can spike or add small amounts of hydrogen peroxide for about 4 hours
before the solution looses it efficacy. Good Luck Bob Henderson