Dear colleagues,

I am searching for a facility (foundry, university lab, etc.) capable of
depositing metals by means of chemical vapor deposition (CVD). A metal like Al,
Cu or W is preferred.

If the given process is a LPCVD, PECVD or any other kind of CVD process is not
important. However, the process temperature is important. The maximum allowable
process temperature is 300 degrees centigrade (572 degrees Fahrenheit), but a
temperature below 300 degrees centrigrade is preferred.

My application is metallization of wafer through-holes, which are insulated by
Parylene C.

Any input is greatly appreciated.

Thanks,
Frank

------------------------
Frank Engel Rasmussen
Industrial Ph.D. student, MEMS research group
Mikroelektronik Centret
Oersteds Plads
Building 345 (east), DTU
DK-2800 Kgs. Lyngby
Denmark