hi,
  for those who had used su-8 2100 before,can you pls read this and help me.
  i am using the above mention to do a project.i understand that i have to
coat about 3-4ml on the substrate to achieve 100 um thickness.But i can't
achieve it.i can only achieve about 60 to 70 um and it is uneven .some part
is 60um and the others parts are 70um.can u pls tell me how can i achieve a
100 um thickness evenly?is there something wrong with the spinning rate
recipe??i am also wondering how  microchem pour the 4ml of su-8.is it they
use direct pouring onto the wafer or they use syringe.can u let me know too?

i also noticed bubbles in the su-8.so i wish to heat the su-8 to get rid of
the bubbles.is there any temperature and time i should follow??i thinking of
heating the su-8 at a temperature of 75 degrees for 30 min becos i noticed
that at that temperature ,the bubbles are gone.but i scared that i might
have accidentally destroyed the characteristic of the su-8.is there such a
possibility??will re-heat(heat more that once) of the su-8 do any damage to
it?

if i heat up the su-8 2100 to get rid of the bubbles,the su-8 will be
fluid-like for sometimes.should i spin immediately to spread the su-8 2100
or do i have to wait for a while.if i have to wait for a while,pls let me
know how long shld i have to wait.

thanks for reading.i hope someone can help to solve my questions.thank you
dav

david


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