You may want to take a look at an article on ED photoresists by Kersten et. al.
in Sensors & Actuators A 51 (1995) 51-54. They demonstrate imaging in 200u deep
silicon trenches with this technique.

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| Robert L. Wood                                                   |
| MCNC, MEMS Technology Applications Center                        |
|                                                                  |
| MCNC, PO Box 12889, Research Triangle Park, NC 27709-2889        |
| email: [email protected] * voice: (919)248-9284 * fax: (919)248-1455|
| URL:   http://mems.mcnc.org                                     |
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