A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: residue after etching doped oxide
residue after etching doped oxide
2002-09-17
Yahong Yao
2002-09-18
Robert C Cole
2002-09-18
[email protected]
residue after etching doped oxide
[email protected]
2002-09-18
If you will run a thermal oxidation step before HF etch this should help
remove the film. Bob Henderson
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Tanner EDA by Mentor Graphics
University Wafer
MEMStaff Inc.
Harrick Plasma, Inc.