Dear all,

Has someone experience with Fused silica etching in a ICP/RIE etchsystem?

I have problems with the surface of the silica. This is after the etch very
rough and not clear.
The sample is 2 inch. The alu chuck is 8 inch and the used gasses are
CHF3/O2 or SF6.


On forehand thanks for your answers,

Regards,

Marco Sengers
Process Engineer Plasma Etching

Dedicated Systems Europe
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