Marco,

I have used the identical process with the same results. We were able to
smoothen the surface with a followup wet etch. The data is published in H.
Becker, K. Lowack, A.Manz, J. Micromech. Microeng. 8, 1998, 24-28.
With best regards
Holger Becker
--
Dr. Holger Becker
IIP-Technologies GmbH
Niebuhrstrasse 1a
D-53113 Bonn
Tel.: +49 228 9695513
Fax: +49 228 9695522
www.iip-tec.com
  ----- Original Message -----
  From: Marco Sengers
  To: mems-talk@memsnet.org
  Sent: Thursday, September 19, 2002 3:45 PM
  Subject: [mems-talk] fused silica etching


  Dear all,

  Has someone experience with Fused silica etching in a ICP/RIE etchsystem?

  I have problems with the surface of the silica. This is after the etch very
  rough and not clear.
  The sample is 2 inch. The alu chuck is 8 inch and the used gasses are
  CHF3/O2 or SF6.


  On forehand thanks for your answers,

  Regards,

  Marco Sengers
  Process Engineer Plasma Etching

  Dedicated Systems Europe
  Microweg 33
  6545 CL Nijmegen, The Netherlands

  Tel: +31-243790818
  Fax: +31-243733626
  mail to: 
  




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