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MEMSnet Home: MEMS-Talk: removing AZ4562 photoresist after exposure to CF4 plasma
removing AZ4562 photoresist after exposure to CF4 plasma
2002-10-29
Oberhammer Joachim
2002-10-29
[email protected]
removing AZ4562 photoresist after exposure to CF4 plasma
[email protected]
2002-10-29
You may try flood UV expose the PR and then put it into the
developer.
reply
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