Dear Gurus,

We´re trying to leave a pattern of lines made of platinum over a silicon
substrate by a relatively simple method. The pattern is transferred using
traditional lithography techniques over the silicon, leaving "grooves". The
next step is to grow silicon dioxide on the whole wafer and then deposit
platinum by evaporation. To remove everything but the platinum left inside
the grooves, we plan to polish the complete surface. The question is
whether this polishing should be special. Should it be dry, or by simply
polishing with clothes and polishing fluids will work? This means, will the
platinum stand the process and stay there?

Thank you for your huge help. Cordially,

Max Fischer
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Maximiliano Fischer
Eng MSc Aero & Astro
CNEA - UNSAM MEMS Group