Hi Jeff,

Here's a comment:

By 1975, production fabs were using plasma etchers (the old barrel
type--all that was available at the time) for etching patterned silicon
nitride.  Hot phosphoric (usually with a reflux lid on it) was used only
for stripping the nitride (no resist).  There may have been a good reason
that "everybody" was using the plasma etchers. It is probably fair to say
that etching silicon nitride was the first use of plasma etchers in the
production fab.  I look forward to responses from other people.

Roger Brennan
8710 Gardners School Road
Stantonburg, NC 27883
(252) 238-3377
[email protected]


-----Original Message-----
From:   Jeff Jessing [SMTP:[email protected]]
Sent:   Tuesday, December 03, 2002 6:41 PM
To:     [email protected]
Subject:        [mems-talk] Photoresists for Hot Phos. Acid Nitride Etching

Hello,

Can someone comment on what resists (g-line) are typically used for
phosphoric acid etching of silicon nitride?

Much thanks.

-Jeff


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