A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Re: SU8 & KOH
Re: SU8 & KOH
2002-12-13
G juarez Martinez
2002-12-16
BERAUER,FRANK (HP-Singapore,ex7)
Re: SU8 & KOH
G juarez Martinez
2002-12-13
Dear Aslam,

SU8 can not be etch by KOH, however if you plan to use it as a mask for
etching other material e.g. silicon. It will NOT work at all.
Reasons:
1. SU8 has poor adhesion for any material and this is more noticeable when
   it is in an aqueous environment. Your SU8 mask will come off.
2. Also SU8 is very sensitive to thermal stress so, putting your sample at
   90C will contribute to lift off the SU8 mask.
3. Even if you use SU8 adhesion promoter, it will not work. As the
   solution recommended for removing the adhesion promoter is as well an
   alkaline solution.

If you are thinking to use SU8 as an etch mask, I would recommend you to
use dry etch. It works really good. I have dry etched 800um of Si using an
SU8 mask!

Good luck
Gabriela Juarez-Martinez
Dept. Electronics
Glasgow University.

> Date: Thu, 12 Dec 2002 03:34:18 -0800 (PST)
> From: aslam muhammad 
> To: mems-talk@memsnet.org
> Subject: [mems-talk] SU 8 PHOTORESIST
> Message-ID: <20021212113418.93003.qmail@web10808.mail.yahoo.com>
> Content-Type: text/plain; charset=us-ascii
> MIME-Version: 1.0
> Precedence: list
> Reply-To: General MEMS discussion 
> Message: 3
>
> Hi all
>
>   it will be a great favour if anybody let me know
> whether SU 8 photoresist withstands in KOH OR TMAH (
> at 90 degree celcius).
>
> thanks in anticipation
>
>
> M.Aslam
>
> __________________________________________________


reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
MEMS Technology Review
Tanner EDA by Mentor Graphics
MEMStaff Inc.
Process Variations in Microsystems Manufacturing