Dear all,
I'm proposing a small competition:
who could use the smallest amount of SU8-100 photoresist to fully spin-coat
one wafer?

Please detail your method and what is the best figure you have obtained
sofar expressing them in ml/inch for easier comparison.

And what will be the price for the winner? Well, the eternal thanks from his
peers, some disdain from the manufacturer (no, I'm sure they are not that
mean :-), and for sure a full feature into
http://aveclafaux.freeservers.com/SU-8.html#top!

And don't be shy, the 'best' method I know of currently (pouring from the
bottle a central puddle then two steps spinning, with first a few hundred
rpm to dispense and then ramping to the final speed) is using more than
25ml/4inch wafer (7ml/inch...) :-(
FranCk
PS: don't forget it is for SU8-100 only, the most visquous in the standard
MCC series.


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