Hi,

I'm trying to work with conductor-insulator layer-structures and now I'm trying
to etch SiO2 with BHF and gold with KI/I2. I use PMMA as etching mask, but it
seems like PMMA is stripping of on the SiO2-surface. How can I get better
adhesion between PMMA and SiO2?

One thing I noticed was, that adhesion is better to the oxidiced silicon than to
the SiO2 that is evaporater to the surface. But that is maybe because evaporated
oxide is of very bad quality compared to oxidiced one.

- MSc Sampo Tuukkanen

____________________________________________
Sampo Tuukkanen, [email protected]
Room K215, Department of Physics
University of Jyväskylä, Finland
Tel. +35814 260 2392