Well, that depends on what you're cleaning.

If I wanted to clean a bare wafer for a furnace deposition, I would start
with piranha (H2SO4:H2O2 5:1), followed by a dip in BOE to remove the
native oxide.

If I wanted to clean a glass wafer with ITO on one side, that I had just
drilled, I would start by scrubbibg it with a PVA sponge with DI water,
followed by acetone and then methanol.

Both of these would be followed with a rinse and dry, as well, and
possibly a dehydration bake, depending on what I'm doing next.


The thing is, it really depends on what you've got on your wafer, and what
you're going to do with it.

Jesse Fowler
  UCLA/MAE Dept., 420 Westwood Plaza, Room 37-129, ENGR IV
  Los Angeles, CA 90095-1597 | (310)825-3977
"Never worry again about the quality of your random numbers!"
    -- Advertisement

On Tue, 26 Nov 2002, Anon wrote:

> Hi,
>
> I was wondering: what are the best practices for cleaning wafers and or
> glassware for typical MEMs research?
>
> Regards,
>
> Anon
>
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