Abhay

I am assuming you are looking for an isotropic etch to remove the polysilicon
layer. If so, have you considered using Xenon Diflouride for this etch. XeF2
does not attack photo resist at all so you can undercut as long as you like. It
also won't attack most other materials like oxide, nitride, metals etc. If you
would like to try it please get in contact with me, in most cases we can run a
sample or two for free.

Best Regards
David Springer
XACTIX, Inc.
(412) 381-3195
www.xactix.com

>>  hi all,
 >>  We are looking for etching a 4000 A polysilicon
 >>  layer. We want the etching do be completed in less
 >>  then 2min as there after our photoresist tend to etch
 >>  away. So what solution shd we try and what proportion.
 >>  Thanks

 >>  Regards
 >>  Abhay Porwal

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